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dc.contributor.authorCao, Peng
dc.contributor.authorZhang, Deliang
dc.date.accessioned2008-11-20T00:39:27Z
dc.date.available2008-11-20T00:39:27Z
dc.date.issued2006
dc.identifier.citationCao, P. & Zhang, D. (2006). Thermal stability of nanocrystalline copper films. International Journal of Modern Physics B, 20(25/27), 3830- 3835.en_US
dc.identifier.urihttps://hdl.handle.net/10289/1411
dc.description.abstractThe grain growth kinetics of nanocrystalline copper thin film samples was investigated. The grain size of nanocrystalline copper samples was determined from the broadening of X-ray spectra. It was found that the grain size increased linearly with isothermal annealing time within the first 10 minutes, beyond which power-law growth kinetics is applied. The activation energy for grain growth was determined by constructing an Arrhenius plot, which shows an activation energy of about 21 – 30 kJ/mol. The low activation energy is attributed to the second phase particle drag and the porosity drag, which act as the pinning force for grain growth in nanocrystalline copper.en_US
dc.language.isoen
dc.publisherWorld Scientific Publishing Coen_NZ
dc.subjectnanocrystallineen_US
dc.subjectthin filmen_US
dc.subjectcopperen_US
dc.subjectthermal stabilityen_US
dc.subjectphysicsen_US
dc.subjectmaterial scienceen_US
dc.titleThermal stability of nanocrystalline copper filmsen_US
dc.typeJournal Articleen_US
dc.identifier.doi10.1142/S0217979206040441en_US
dc.relation.isPartOfInternational Journal of Modern Physics Ben_NZ
pubs.begin-page3830en_NZ
pubs.editionOctoberen_NZ
pubs.elements-id32161
pubs.end-page3835en_NZ
pubs.issue25-27en_NZ
pubs.volume20en_NZ


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