dc.contributor.author | Cao, Peng | |
dc.contributor.author | Zhang, Deliang | |
dc.date.accessioned | 2008-11-20T00:39:27Z | |
dc.date.available | 2008-11-20T00:39:27Z | |
dc.date.issued | 2006 | |
dc.identifier.citation | Cao, P. & Zhang, D. (2006). Thermal stability of nanocrystalline copper films. International Journal of Modern Physics B, 20(25/27), 3830- 3835. | en_US |
dc.identifier.uri | https://hdl.handle.net/10289/1411 | |
dc.description.abstract | The grain growth kinetics of nanocrystalline copper thin film samples was investigated. The grain size of nanocrystalline copper samples was determined from the broadening of X-ray spectra. It was found that the grain size increased linearly with isothermal annealing time within the first 10 minutes, beyond which power-law growth kinetics is applied. The activation energy for grain growth was determined by constructing an Arrhenius plot, which shows an activation energy of about 21 – 30 kJ/mol. The low activation energy is attributed to the second phase particle drag and the porosity drag, which act as the pinning force for grain growth in nanocrystalline copper. | en_US |
dc.language.iso | en | |
dc.publisher | World Scientific Publishing Co | en_NZ |
dc.subject | nanocrystalline | en_US |
dc.subject | thin film | en_US |
dc.subject | copper | en_US |
dc.subject | thermal stability | en_US |
dc.subject | physics | en_US |
dc.subject | material science | en_US |
dc.title | Thermal stability of nanocrystalline copper films | en_US |
dc.type | Journal Article | en_US |
dc.identifier.doi | 10.1142/S0217979206040441 | en_US |
dc.relation.isPartOf | International Journal of Modern Physics B | en_NZ |
pubs.begin-page | 3830 | en_NZ |
pubs.edition | October | en_NZ |
pubs.elements-id | 32161 | |
pubs.end-page | 3835 | en_NZ |
pubs.issue | 25-27 | en_NZ |
pubs.volume | 20 | en_NZ |