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      Garment pattern definition, development and application with associative feature approach

      Au, Chi Kit; Ma, Y.-S.
      DOI
       10.1016/j.compind.2010.03.002
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      Au, C.K. & Ma, Y.-S. (2010). Garment pattern definition, development and application with associative feature approach. Computers in Industry, 61(6), 524-531.
      Permanent Research Commons link: https://hdl.handle.net/10289/4211
      Abstract
      Garment virtual design has been evolved significantly with the rapid development of 3D CAD tools, especially with the convenient availability of NURBS surface modeling capability. Parametric development of clothes is demanded in line with the trend of mass customization according to the true measures of customers or regulated sizes of certain markets. Virtual design features with well-defined associations with the parametric mannequins are enablers. To achieve an intelligent mass customization approach, the development of surface patches from 3D clothing designs to 2D flattened patterns become essential. This article addresses the definition, development and application of garment features with an associative feature approach.
      Date
      2010
      Type
      Journal Article
      Publisher
      Elsevier
      Collections
      • Science and Engineering Papers [3122]
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