Garment pattern definition, development and application with associative feature approach

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dc.contributor.authorAu, Chi Kit
dc.contributor.authorMa, Y.-S.
dc.date.accessioned2010-07-29T05:03:12Z
dc.date.available2010-07-29T05:03:12Z
dc.date.issued2010
dc.description.abstractGarment virtual design has been evolved significantly with the rapid development of 3D CAD tools, especially with the convenient availability of NURBS surface modeling capability. Parametric development of clothes is demanded in line with the trend of mass customization according to the true measures of customers or regulated sizes of certain markets. Virtual design features with well-defined associations with the parametric mannequins are enablers. To achieve an intelligent mass customization approach, the development of surface patches from 3D clothing designs to 2D flattened patterns become essential. This article addresses the definition, development and application of garment features with an associative feature approach.en_NZ
dc.identifier.citationAu, C.K. & Ma, Y.-S. (2010). Garment pattern definition, development and application with associative feature approach. Computers in Industry, 61(6), 524-531.en_NZ
dc.identifier.doi10.1016/j.compind.2010.03.002en_NZ
dc.identifier.urihttps://hdl.handle.net/10289/4211
dc.language.isoen
dc.publisherElsevieren_NZ
dc.relation.isPartOfComputers in Industryen_NZ
dc.subjectgarment patternen_NZ
dc.subjectdevelopable surfaceen_NZ
dc.subjectassociative featureen_NZ
dc.titleGarment pattern definition, development and application with associative feature approachen_NZ
dc.typeJournal Articleen_NZ
pubs.begin-page524en_NZ
pubs.elements-id35188
pubs.end-page531en_NZ
pubs.issue6en_NZ
pubs.volume61en_NZ
uow.identifier.article-no6en_NZ
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